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Field-effect Modulation of Anomalous Hall Effect in Diluted Ferromagnetic Topological Insulator Epitaxial Films

机译:稀释气体中异常霍尔效应的场效应调制   铁磁拓扑绝缘子外延膜

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摘要

High quality chromium (Cr) doped three-dimensional topological insulator (TI)Sb2Te3 films are grown via molecular beam epitaxy on heat-treated insulatingSrTiO3(111) substrates. We report that the Dirac surface states are insensitiveto Cr doping, and a perfect robust long-range ferromagnetic order is unveiledin epitaxial Sb2-xCrxTe3 films. The anomalous Hall effect is modulated byapplying a bottom gate, contrary to the ferromagnetism in conventional dilutedmagnetic semiconductors (DMSs), here the coercivity field is not significantlychanged with decreasing carrier density. Carrier-independent ferromagnetismheralds Sb2-xCrxTe3 films as the base candidate TI material to realize thequantum anomalous Hall (QAH) effect. These results also indicate the potentialof controlling anomalous Hall voltage in future TI-based magneto-electronicsand spintronics.
机译:通过分子束外延在热处理过的绝缘SrTiO3(111)衬底上生长高质量的铬(Cr)掺杂的三维拓扑绝缘体(TI)Sb2Te3薄膜。我们报告说,狄拉克表面状态对Cr掺杂不敏感,并且在外延Sb2-xCrxTe3薄膜中揭示了一个完善的强效远距离铁磁有序。与常规的稀磁半导体(DMS)中的铁磁性相反,通过应用底栅来调制异常霍尔效应,此处矫顽力场不会随着载流子密度的降低而显着变化。独立于载体的铁磁性先驱体将Sb2-xCrxTe3薄膜作为TI材料的基础候选材料,以实现量子异常霍尔(QAH)效应。这些结果也表明在未来基于TI的磁电子和自旋电子学中控制异常霍尔电压的潜力。

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